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Invited Lectures
(An additional Invited Lecture will be given by the IBMM Prize Winner)
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Steve Donnelly, University of Salford, U.K.:
Ion-beam induced amorphisation of Si revisited |
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Zhang Yanwen, Pacific Northwest National Laboratory, USA:
Response of Materials to Single Ion Events |
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Marika Schleberger, University Duisburg/Essen, Germany:
Patterning of insulating surfaces by electronic energy deposition induced by fast heavy ions |
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Frederico Garrido, CSNSM Orsay, France:
Radiation Stability of Fluorite-structured Oxides Submitted to Intense Electronic Excitation |
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Manabu Ishimaru, Osaka University, Japan:
Structural relaxation and recrystallization of amorphous SiC during post-implantation thermal annealing |
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Bhupen Dev, Institute of Physics Bhubaneswar, India:
Cross-over behaviour in electrical response in swift heavy ion irradiated copper-oxide/copper thin film systems |
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Bengt Svensson, Oslo University, Norway:
Ion Beam Processing of Wide Bandgap Semiconductor Materials |
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Martin Weiser, Carl Zeiss Oberkochem, Germany:
Ion beam figuring for lithography optics |
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Giovanni Mattei, University of Padova, Italy:
Metal nanoclusters by ion implantation for nanophotonics |
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Rob Elliman, Australian National University, Australia:
Ion beam synthesis and properties of optically-active silica nanowires |
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Katharina Lorenz, ITN Lisbon, Portugal:
Rare Earth implantation of AlN for light emission from IR to UV |
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Francesco Buatier de Mongeot, University of Genova, Italy:
Nanoscale ion patterning of metal surfaces: from single crystals to supported films |
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Günther Dollinger, Universität der Bundeswehr Munich, Germany:
Life Cell Micro-Irradiation Using Energetic Ions |
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Jordi Sort, ICN Bellaterra, Spain:
Direct generation of nanoscale ferromagnetic dots by selective ion irradiation of paramagnetic FeAl alloys |
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Noriaki Toyoda, University of Hyogo, Japan:
Fundamental characteristics and applications of gas cluster ion impacts |
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The following special Evening Lectures will be given:
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Jan Meijer, University of Bochum, Germany:
MeV ion beam implantation for industrial applications: Status and Prospects |
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Hans Leiter, EADS Astrium Lampoldshausen, Germany:
Ion based space propulsion for commercial applications, space exploration and fundamental physics |
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Wang Xi, Simgui Technology Shanghai, China:
Industrial SOI technology by ion implantation |
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